Plasma Enhanced Chemical Vapor Deposition (PECVD) Michael 2018-03-12 22:31 A20180312008 進階 點閱 204 留言 0 E 0 T 0 免費 進階 點閱 204 留言 0 E 0 T 0 Because PECVD needs High Vacuum (HV) and the evaporated film may be rapidly deposited on the substrate in a large amount, so the cost is lower and it's suitable for mass production. (共同作者:Hightech)